Excimer laser CL-7020

In the laboratory, there is the pulsed excimer laser, which is used in various methods of materials processing, including recording of gratings on fibers, thin film materials processing. Also, the laser radiation is used for the study of photoinduced processes, including photoionization of different materials.

Working substance ArF

Emission wavelength 193 nm

Pulse energy 250 mJ

The average power 5 W

Pulse duration  20 ns

Pulse repetition frequency 1-300 Hz